首页
多项目晶圆服务
晶圆代工服务
晶圆制造工艺
Silicon IP服务
芯片设计服务
芯片封装服务
招贤纳才
当前位置:
首页
--晶圆制造工艺--Globalfoundries
Globalfoundries半导体制造工艺
Analog
0.13um, High Performance Dual Gate
0.13um, Low Power Dual Gate
0.13um, Low Voltage Dual Gate
0.13um, Generic Dual Gate
0.18um, 1.8V / 3.3V CB
0.18um, 1.8V / 3.3V IC
0.18um, 1.8V / 6V ULL
0.22um, 2.5V / 3.3V Dual Gate
0.22um, 2.5V / 5V Dual Gate
0.25um, 2.5V / 3.3V Dual Gate
0.35um, 3.3V Salicide
0.35um, 3.3V / 5V Salicide
0.60um,5V Salicide
Logic
0.13um, High Performance Dual Gate
0.13um, Low Power Dual Gate
0.13um, Low Voltage Dual Gate
0.13um, Generic Dual Gate
0.18um, 1.8V / 3.3V CB
0.18um, 1.8V / 3.3V IC
0.18um, 1.8V / 6V ULL
0.25um, 2.5V / 3.3V Dual Gate
0.25um, 2.5V / 5V Dual Gate
0.35um, 3.3V Salicide
0.35um, 3.3V / 5V Salicide
0.50um, 5V
0.50um, 3.3V
NVM
0.13um, OTP
0.18um, 1.8V / 3.3V SONOS eFLASH IB
0.18um, 1.8V / 3.3V OTP CB
0.18um, 1.8V / 3.3V OTP IC
0.25um, 2.5V / 3.3V Dual Gate OTP
0.25um, 2.5V / 5V Dual Gate OTP
0.35um, EEPROM
0.35um, OTP
0.60um, EEPROM
0.80um, EEPROM
RF
0.13um, Low Power Dual Gate
0.13um, Generic Dual Gate
0.18um, 1.8V / 3.3V CB
0.25um, 2.5V / 3.3V Dual Gate
0.35um, 3.3V Salicide
HV
0.18um, 1.8V / 6V ULL
0.18um, 1.8V / 6V / 16V ULL
0.18um, 1.8V / 6V / 20V ULL
0.18um, 1.8V / 6V / 32V ULL
0.35um, 3.3V / 13.5V Polycide
0.35um, 3.3V / 18V Salicide
0.35um, 3.3V / ±9V Salicide
SiGe BiCMOS
0.18um, 1.8V / 3.3V CB
0.35um, 3.3V / 5V (MOS)
BiCMOS
0.60um, 5V CMOS / 5V NPN
0.60um, 5V CMOS / 3.3V NPN
CSMC
SMIC
Grace
Globalfoundries
HHNEC
TSMC